Introduction of Instrument

Magnetron sputtering is a device for coating gold (Au), palladium (Pd), platinum (Pt) and gold/palladium (Au/Pd) films on non-conductive or non-conductive samples by physical vapor deposition, commonly used for SEM sample preparation and electrode preparation。It can be formed in a relatively short time with a fine particle size of uniform film, the most common target is gold target, so magnetron sputtering instrument is also commonly known as "gold spray instrument".

Working Principle

In the closed chamber, the anode target is placed, filled with gas, a certain vacuum is maintained, and high voltage is loaded between the anode and cathode, and the glow discharge phenomenon occurs.Ionized gas ions will bombard and erode the anode target material. The target atoms will thus diffuse in all directions and deposit on the sample, eventually forming a uniform coating on the sample surface. This coating inhibits charging, reduces thermal damage, and increases secondary electron yield, thus improving SEM observation.

Notices

1. Do not exceed 120s for a single sputtering session, or multiple sputtering sessions for thick electrode films.

2. When picking up the top cover to place the sample, place the cover in the original orientation on the side of the sputter cell.

3. Please make sure that the operating current of the ion sputterer is stable before starting sputtering.

4. For a single long sputtering time, a water cooler is required.

5. The use of undried samples and unadhered powder samples is prohibited.

6. It is forbidden to touch the target with hands to prevent dirt and samples from sticking to the target and affecting its use.

Explain:Jikun Yin, 2020 master

Photograph: Yuqing Liu, 2022 master-Mingmin Li's team

Montage:Zhifan Zhang, 2022 master-Jingjuan Liu's team